Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Study of Multilayer Thin Film Structures by Rutherford Backscattering Spectrometry

Journal Article · · Technical Physics Letters
; ; ;  [1]
  1. K.A. Valiev Institute of Physics and Technology (Yaroslavl Branch), Russian Academy of Sciences (Russian Federation)
We have evaluated possibilities of using the method of Rutherford backscattering spectrometry (RBS) for depth profiling of multilayer thin-film structures containing nanodmensional layers of elements with close atomic masses. It is established that RBS measurements can ensure high precision determination of the composition of these multilayer structures, total film thickness, and thicknesses of separate layers. This ability can be used for the input quality control of multilayer structures used in micro- and nanotechnologies.
OSTI ID:
22929234
Journal Information:
Technical Physics Letters, Journal Name: Technical Physics Letters Journal Issue: 6 Vol. 45; ISSN 1063-7850
Country of Publication:
United States
Language:
English

Similar Records

Rutherford Backscattering Spectrometry: A quantitative technique for chemical and structural analysis of surfaces and thin films
Journal Article · Sun Jun 01 00:00:00 EDT 1986 · RCA Rev.; (United States) · OSTI ID:5162083

Rutherford backscattering spectrometry analysis of TiO{sub 2} thin films
Journal Article · Fri Mar 14 23:00:00 EST 2003 · Materials Characterization · OSTI ID:20748691

Rutherford backscattering spectrometry characterization of nanoporous chalcogenide thin films grown at oblique angles
Journal Article · Tue Apr 08 00:00:00 EDT 2008 · Journal of Analytical Atomic Spectrometry · OSTI ID:1035006