skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Surface Nanostructures Forming during the Early Stages of the Metal-Assisted Chemical Etching of Silicon. Optical Properties of Silver Nanoparticles

Abstract

In this two-part work, nanostructures formed in a three-step process of metal-assisted chemical etching of silicon are investigated. In the first part (present publication), the process of the chemical deposition of a layer of self-assembled silver nanoparticles on the surface of a silicon wafer (the first stage of metalassisted chemical etching) is studied. This layer, on the one hand, serves as a catalyst for the subsequent etching of silicon, and, on the other hand, represents a kind of mask for the formation of a certain topology of the emerging Si nanowires. The morphology of the obtained 40- to 60-nm-thick silver nanoparticle layers is investigated by scanning electron microscopy. The spectral dependences of the ellipsometric angles Ψ and Δ are measured using spectroscopic ellipsometry (λ = 250–900nm), and the complex dielectric function of the silver nanolayers is determined from these spectra. The dielectric function features a characteristic plasmon resonance peak in the ultraviolet spectral range. The study of the optical properties of Si nanofilament layers which form during the early stages of metal-assisted chemical etching will be reported as the second part of this work in a separate publication.

Authors:
; ; ;  [1]
  1. Ioffe Institute (Russian Federation)
Publication Date:
OSTI Identifier:
22750047
Resource Type:
Journal Article
Journal Name:
Semiconductors
Additional Journal Information:
Journal Volume: 52; Journal Issue: 3; Other Information: Copyright (c) 2018 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1063-7826
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; DIELECTRIC MATERIALS; ELECTRON SPECTRA; ETCHING; NANOPARTICLES; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SILICON; SILVER; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTRA

Citation Formats

Zharova, Yu. A., E-mail: piliouguina@mail.ioffe.ru, Tolmachev, V. A., Bednaya, A. I., and Pavlov, S. I. Surface Nanostructures Forming during the Early Stages of the Metal-Assisted Chemical Etching of Silicon. Optical Properties of Silver Nanoparticles. United States: N. p., 2018. Web. doi:10.1134/S1063782618030235.
Zharova, Yu. A., E-mail: piliouguina@mail.ioffe.ru, Tolmachev, V. A., Bednaya, A. I., & Pavlov, S. I. Surface Nanostructures Forming during the Early Stages of the Metal-Assisted Chemical Etching of Silicon. Optical Properties of Silver Nanoparticles. United States. doi:10.1134/S1063782618030235.
Zharova, Yu. A., E-mail: piliouguina@mail.ioffe.ru, Tolmachev, V. A., Bednaya, A. I., and Pavlov, S. I. Thu . "Surface Nanostructures Forming during the Early Stages of the Metal-Assisted Chemical Etching of Silicon. Optical Properties of Silver Nanoparticles". United States. doi:10.1134/S1063782618030235.
@article{osti_22750047,
title = {Surface Nanostructures Forming during the Early Stages of the Metal-Assisted Chemical Etching of Silicon. Optical Properties of Silver Nanoparticles},
author = {Zharova, Yu. A., E-mail: piliouguina@mail.ioffe.ru and Tolmachev, V. A. and Bednaya, A. I. and Pavlov, S. I.},
abstractNote = {In this two-part work, nanostructures formed in a three-step process of metal-assisted chemical etching of silicon are investigated. In the first part (present publication), the process of the chemical deposition of a layer of self-assembled silver nanoparticles on the surface of a silicon wafer (the first stage of metalassisted chemical etching) is studied. This layer, on the one hand, serves as a catalyst for the subsequent etching of silicon, and, on the other hand, represents a kind of mask for the formation of a certain topology of the emerging Si nanowires. The morphology of the obtained 40- to 60-nm-thick silver nanoparticle layers is investigated by scanning electron microscopy. The spectral dependences of the ellipsometric angles Ψ and Δ are measured using spectroscopic ellipsometry (λ = 250–900nm), and the complex dielectric function of the silver nanolayers is determined from these spectra. The dielectric function features a characteristic plasmon resonance peak in the ultraviolet spectral range. The study of the optical properties of Si nanofilament layers which form during the early stages of metal-assisted chemical etching will be reported as the second part of this work in a separate publication.},
doi = {10.1134/S1063782618030235},
journal = {Semiconductors},
issn = {1063-7826},
number = 3,
volume = 52,
place = {United States},
year = {2018},
month = {3}
}