Assembly of Arbitrary Designer Heterostructures with Atomically Clean Interfaces

Jin, Keda; Wichmann, Tobias; Wenzel, Sabine; Samuely, Tomas; Onufriienko, Oleksander; Szabó, Pavol; Watanabe, Kenji; Taniguchi, Takashi; Yan, Jiaqiang; Tautz, F. Stefan; Lüpke, Felix; Ternes, Markus; Martinez‐Castro, Jose

doi:10.1002/admi.202300658

Assembly of Arbitrary Designer Heterostructures with Atomically Clean Interfaces

Journal Article · Fri Oct 27 00:00:00 EDT 2023 · Advanced Materials Interfaces

DOI:https://doi.org/10.1002/admi.202300658· OSTI ID:2267619

Jin, Keda ^[1]; Wichmann, Tobias ^[2]; Wenzel, Sabine ^[3]; Samuely, Tomas ^[4]; Onufriienko, Oleksander ^[4]; Szabó, Pavol ^[4]; Watanabe, Kenji ^[5]; Taniguchi, Takashi ^[5]; ^[6]; Tautz, F. Stefan ^[2]; Lüpke, Felix ^[3]; Ternes, Markus ^[1]; ^[1]

Forschungszentrum Juelich (Germany). Peter Grünberg Institut (PGI-3); Jülich Aachen Research Alliance (Germany); RWTH Aachen Univ. (Germany). Institute for Experimental Physics II B
Forschungszentrum Juelich (Germany). Peter Grünberg Institut (PGI-3); Jülich Aachen Research Alliance (Germany); RWTH Aachen Univ. (Germany). Institute for Experimental Physics IV A
Forschungszentrum Juelich (Germany). Peter Grünberg Institut (PGI-3); Jülich Aachen Research Alliance (Germany)
Pavol Jozef Šafárik University, Košice (Slovakia); Slovak Academy of Sciences, Košice (Slovakia). Institute of Experimental Physics
National Institute for Materials Science, Namiki (Japan)
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Van der Waals heterostructures are an excellent platform for studying intriguing interface phenomena, such as moiré and proximity effects. Many of these phenomena occurring in such heterostructures' interfaces and surfaces have so far been hampered because of their high sensitivity to disorder and interface contamination. Here, it reports a dry polymer-based assembly technique to fabricate arbitrary designer van der Waals heterostructures with atomically clean surfaces. The key features of the suspended dry pick-up and flip-over assembly technique are: 1) the heterostructure surface never comes into contact with polymers, 2) the assemble is entirely solvent-free, 3) it is entirely performed in a glovebox, and 4) it only requires temperatures below 130 °C. By performing ambient atomic force microscopy and atomically-resolved scanning tunneling microscopy on example heterostructures, it demonstrates the fabrication of air-sensitive heterostructures with ultra-clean interfaces and surfaces. It envisions that, due to the avoidance of polymer melting, this technique is potentially compatible with heterostructure assembly under ultra-high vacuum conditions, which promises ultimate heterostructure quality.

View Accepted Manuscript (DOE)

Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE); European Union (EU)

Grant/Contract Number:: AC05-00OR22725

OSTI ID:: 2267619

Journal Information:: Advanced Materials Interfaces, Journal Name: Advanced Materials Interfaces Journal Issue: 1 Vol. 11; ISSN 2196-7350

Publisher:: Wiley-VCHCopyright Statement

Country of Publication:: United States

Language:: English

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