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Formation of silicon nanocrystals in multilayer nanoperiodic a-SiO{sub x}/insulator structures from the results of synchrotron investigations

Journal Article · · Semiconductors
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  1. Voronezh State University (Russian Federation)
  2. Lobachevsky State University of Nizhny Novgorod (Russian Federation)
The problem of the efficiency of the controllable formation of arrays of silicon nanoparticles is studied on the basis of detailed investigations of the electronic structure of multilayer nanoperiodic a-SiO{sub x}/SiO{sub 2}, a-SiO{sub x}/Al{sub 2}O{sub 3}, and a-SiO{sub x}/ZrO{sub 2} compounds. Using synchrotron radiation and the X-ray absorption near edge structure (XANES) spectroscopy technique, a modification is revealed for the investigated structures under the effect of high-temperature annealing at the highest temperature of 1100°C; this modification is attributed to the formation of silicon nanocrystals in the layers of photoluminescent multilayer structures.
OSTI ID:
22649606
Journal Information:
Semiconductors, Journal Name: Semiconductors Journal Issue: 3 Vol. 51; ISSN SMICES; ISSN 1063-7826
Country of Publication:
United States
Language:
English