Study on the effect of hydrogen addition on the variation of plasma parameters of argon-oxygen magnetron glow discharge for synthesis of TiO{sub 2} films

Journal Article · Fri Apr 15 00:00:00 EDT 2016 · AIP Advances

DOI:https://doi.org/10.1063/1.4947091· OSTI ID:22611669

Saikia, Partha ^[1]; Saikia, Bipul Kumar ^[1]; Bhuyan, Heman ^[2]

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1. Centre of Plasma Physics, Institute for Plasma Research, Nazirakhat, Sonapur-782 402, Kamrup, Assam (India)
2. Institute of Physics, Pontificia Universidad Católica de Chile, Av. Vicuña Mackenna 4860, Santiago (Chile)

We report the effect of hydrogen addition on plasma parameters of argon-oxygen magnetron glow discharge plasma in the synthesis of H-doped TiO{sub 2} films. The parameters of the hydrogen-added Ar/O{sub 2} plasma influence the properties and the structural phases of the deposited TiO{sub 2} film. Therefore, the variation of plasma parameters such as electron temperature (T{sub e}), electron density (n{sub e}), ion density (n{sub i}), degree of ionization of Ar and degree of dissociation of H{sub 2} as a function of hydrogen content in the discharge is studied. Langmuir probe and Optical emission spectroscopy are used to characterize the plasma. On the basis of the different reactions in the gas phase of the magnetron discharge, the variation of plasma parameters and sputtering rate are explained. It is observed that the electron and heavy ion density decline with gradual addition of hydrogen in the discharge. Hydrogen addition significantly changes the degree of ionization of Ar which influences the structural phases of the TiO{sub 2} film.

• OSTI ID: 22611669
• Journal Information: AIP Advances, Vol. 6, Issue 4; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2158-3226
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ARGON IONS
DOPED MATERIALS
ELECTRON DENSITY
ELECTRON TEMPERATURE
EMISSION
EMISSION SPECTROSCOPY
FILMS
GLOW DISCHARGES
HYDROGEN ADDITIONS
ION DENSITY
IONIZATION
LANGMUIR PROBE
MAGNETRONS
MOLECULAR IONS
OXYGEN
PLASMA
SPUTTERING
SYNTHESIS
TITANIUM OXIDES