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Sub-wavelength InAs quantum dot micro-disk lasers epitaxially grown on exact Si (001) substrates

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4952600· OSTI ID:22590718
; ;  [1];  [2]; ;  [1];  [3]
  1. Materials Department, University of California Santa Barbara, Santa Barbara, California 93106 (United States)
  2. Sandia National Laboratories, Albuquerque, New Mexico 87185-1086 (United States)
  3. School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States)
Subwavelength micro-disk lasers (MDLs) as small as 1 μm in diameter on exact (001) silicon were fabricated using colloidal lithography. The micro-cavity gain medium incorporating five-stacked InAs quantum dot layers was grown on a high crystalline quality GaAs-on-V-grooved-Si template with no absorptive intermediate buffers. Under continuous-wave optical pumping, the MDLs on silicon exhibit lasing in the 1.2-μm wavelength range with low thresholds down to 35 μW at 10 K. The MDLs compare favorably with devices fabricated on native GaAs substrates and state-of-the-art work reported elsewhere. Feasibility of device miniaturization can be projected by size-dependent lasing characteristics. The results show a promising path towards dense integration of photonic components on the mainstream complementary metal–oxide–semiconductor platform.
OSTI ID:
22590718
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 22 Vol. 108; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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