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Light emission from silicon with tin-containing nanocrystals

Journal Article · · AIP Advances
DOI:https://doi.org/10.1063/1.4926596· OSTI ID:22493937
 [1]; ; ; ; ; ;  [1];  [2];  [3]
  1. Interdisciplinary Nanoscience Center (iNANO), Aarhus University, Gustav Wieds Vej 14, DK-8000 Aarhus C (Denmark)
  2. Belarussian State University, Praspyekt Nyezalyezhnastsi 4, 220030 Minsk (Belarus)
  3. Department of Physics and Astronomy, Aarhus University, Ny Munkegade 120, DK-8000 Aarhus C (Denmark)

Tin-containing nanocrystals, embedded in silicon, have been fabricated by growing an epitaxial layer of Si{sub 1−x−y}Sn{sub x}C{sub y}, where x = 1.6 % and y = 0.04 % on a silicon substrate, followed by annealing at various temperatures ranging from 650 {sup ∘}C to 900 {sup ∘}C. The nanocrystal density and average diameters are determined by scanning transmission-electron microscopy to ≈10{sup 17} cm{sup −3} and ≈5 nm, respectively. Photoluminescence spectroscopy demonstrates that the light emission is very pronounced for samples annealed at 725 {sup ∘}C, and Rutherford back-scattering spectrometry shows that the nanocrystals are predominantly in the diamond-structured phase at this particular annealing temperature. The origin of the light emission is discussed.

OSTI ID:
22493937
Journal Information:
AIP Advances, Journal Name: AIP Advances Journal Issue: 7 Vol. 5; ISSN AAIDBI; ISSN 2158-3226
Country of Publication:
United States
Language:
English

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