Polarization-induced Zener tunnel diodes in GaN/InGaN/GaN heterojunctions
- Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556 (United States)
By the insertion of thin In{sub x}Ga{sub 1−x}N layers into Nitrogen-polar GaN p-n junctions, polarization-induced Zener tunnel junctions are studied. The reverse-bias interband Zener tunneling current is found to be weakly temperature dependent, as opposed to the strongly temperature-dependent forward bias current. This indicates tunneling as the primary reverse-bias current transport mechanism. The Indium composition in the InGaN layer is systematically varied to demonstrate the increase in the interband tunneling current. Comparing the experimentally measured tunneling currents to a model helps identify the specific challenges in potentially taking such junctions towards nitride-based polarization-induced tunneling field-effect transistors.
- OSTI ID:
- 22485953
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 16 Vol. 107; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
Similar Records
Polarization-engineered GaN/InGaN/GaN tunnel diodes
Isotype InGaN/GaN heterobarrier diodes by ammonia molecular beam epitaxy
Demonstration of forward inter-band tunneling in GaN by polarization engineering
Journal Article
·
Sun Nov 14 23:00:00 EST 2010
· Applied Physics Letters
·
OSTI ID:21464571
Isotype InGaN/GaN heterobarrier diodes by ammonia molecular beam epitaxy
Journal Article
·
Sat Feb 06 23:00:00 EST 2016
· Journal of Applied Physics
·
OSTI ID:22494997
Demonstration of forward inter-band tunneling in GaN by polarization engineering
Journal Article
·
Sun Dec 04 23:00:00 EST 2011
· Applied Physics Letters
·
OSTI ID:22027840