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Construction of van der Waals magnetic tunnel junction using ferromagnetic layered dichalcogenide

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4930311· OSTI ID:22482050
; ; ;  [1];  [2];  [1]
  1. Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505 (Japan)
  2. Department of Chemistry, Graduate School of Science and Engineering, Saitama University, Saitama 338-8570 (Japan)
We investigate the micromechanical exfoliation and van der Waals (vdW) assembly of ferromagnetic layered dichalcogenide Fe{sub 0.25}TaS{sub 2}. The vdW interlayer coupling at the Fe-intercalated plane of Fe{sub 0.25}TaS{sub 2} allows exfoliation of flakes. A vdW junction between the cleaved crystal surfaces is constructed by dry transfer method. We observe tunnel magnetoresistance in the resulting junction under an external magnetic field applied perpendicular to the plane, demonstrating spin-polarized tunneling between the ferromagnetic layered material and the vdW junction.
OSTI ID:
22482050
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 10 Vol. 107; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English