Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Raman spectroscopy of InGaAs/GaAs nanoheterostructures δ-doped with Mn

Journal Article · · Semiconductors
; ; ;  [1]; ;  [2];  [3]
  1. Lobachevsky State University of Nizhni Novgorod, Physical Technical Research Institute (Russian Federation)
  2. Lobachevsky State University of Nizhni Novgorod (Russian Federation)
  3. Russian Academy of Sciences, Institute for Physics of Microstructures (Russian Federation)
The results of complex studies of InGaAs/GaAs nanoheterostructures δ-doped with Mn are reported. The structures are grown by metal-organic vapor-phase epitaxy in combination with laser deposition. By confocal Raman spectroscopy, it is shown that the low-temperature δ-doped GaAs cap layers are of higher crystal quality compared to uniformly doped layers. Scattering of light in the coupled phonon-plasmon mode is observed. The appearance of this mode is conditioned by the diffusion of manganese from the δ-layer. The thickness of the cap layer is found to be d{sub c} ≈ 9–20 nm, optimal for attainment of the highest photoluminescence intensity of the quantum well and the highest layer concentration of holes by doping with manganese.
OSTI ID:
22470129
Journal Information:
Semiconductors, Journal Name: Semiconductors Journal Issue: 1 Vol. 49; ISSN SMICES; ISSN 1063-7826
Country of Publication:
United States
Language:
English