Temperature dependences of the photoluminescence intensities of centers in silicon implanted with erbium and oxygen ions
- Russian Academy of Sciences, Ioffe Physical–Technical Institute (Russian Federation)
Low-temperature photoluminescence in n-Cz-Si after the implantation of erbium ions at an elevated temperature and subsequent implantation of oxygen ions at room temperature is studied. So-called X and W centers formed from self-interstitial silicon atoms, H and P centers containing oxygen atoms, and Er centers containing Er{sup 3+} ions are observed in the photoluminescence spectra. The energies of enhancing and quenching of photoluminescence for these centers are determined. These energies are determined for the first time for X and H centers. In the case of P and Er centers, the values of the energies practically coincide with previously published data. For W centers, the energies of the enhancing and quenching of photoluminescence depend on the conditions of the formation of these centers.
- OSTI ID:
- 22469670
- Journal Information:
- Semiconductors, Journal Name: Semiconductors Journal Issue: 12 Vol. 49; ISSN SMICES; ISSN 1063-7826
- Country of Publication:
- United States
- Language:
- English
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