Enhancement of the barrier performance in organic/inorganic multilayer thin-film structures by annealing of the parylene layer

Journal Article · Wed Oct 15 04:00:00 EDT 2014 · Materials Research Bulletin

DOI:https://doi.org/10.1016/J.MATERRESBULL.2014.03.022· OSTI ID:22420575

Kim, Namsu ^[1]; Graham, Samuel ^[1]; Hwang, Kyung-Jun ^[2]

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1. George W. Woodruff School of Mechanical Engineering, 801 Ferst Drive, Georgia Institute of Technology, Atlanta, GA 30332 (United States)
2. Mechanical and Aerospace Engineering, University of California at San Diego (UCSD), 9500 Gilman Drive, La Jolla, CA 92093-0411 (United States)

Highlights: • High performance thin-film barrier structure for encapsulation was fabricated. • By annealing parylene in encapsulation structure, the barrier performance was improved. • The effective water vapor transmission rate is 7.2 ± 3.0 × 10{sup −6} g/m{sup 2}/day. - Abstract: A multilayered barrier structure was fabricated by chemical vapor deposition of parylene and subsequent plasma-enhanced chemical vapor deposition of SiO{sub x} or SiN{sub x}. The barrier performance against water vapor ingress was significantly improved by annealing the parylene layer before the deposition of either SiO{sub x} or SiN{sub x}. The mechanism of this enhancement was investigated using atomic force microscopy, Raman spectroscopy, and X-ray diffraction. The surface roughness of the parylene before the deposition of either SiO{sub x} or SiN{sub x} was found to correlate closely with the barrier performance of the multilayered structures. In addition, removing absorbed water vapor in the film by annealing results in a lower water vapor transmission rate in the transient region and a longer lag time. Annealing the parylene leads to a large decrease in the effective water vapor transmission rate, which reaches 7.2 ± 3.0 × 10{sup −6} g/m{sup 2}/day.

• OSTI ID: 22420575
• Journal Information: Materials Research Bulletin, Journal Name: Materials Research Bulletin Vol. 58; ISSN MRBUAC; ISSN 0025-5408
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANNEALING
ATOMIC FORCE MICROSCOPY
CHEMICAL VAPOR DEPOSITION
LAYERS
MICROSTRUCTURE
ORGANIC POLYMERS
RAMAN SPECTROSCOPY
ROUGHNESS
SILICON OXIDES
SURFACES
THIN FILMS
TRANSIENTS
WATER VAPOR
X-RAY DIFFRACTION