Long-term stable water vapor permeation barrier properties of SiN/SiCN/SiN nanolaminated multilayers grown by plasma-enhanced chemical vapor deposition at extremely low pressures

Journal Article · Mon Aug 04 04:00:00 EDT 2014 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4892354· OSTI ID:22314515

Lee, Jong Ho ^[1]

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1. National Center for Nanoprocess and Equipment, Korea Institute of Industrial Technology, Gwangju 500-480 (Korea, Republic of)

We investigated the water vapor permeation barrier properties of 30-nm-thick SiN/SiCN/SiN nanolaminated multilayer structures grown by plasma enhanced chemical vapor deposition at 7 mTorr. The derived water vapor transmission rate was 1.12 × 10{sup −6} g/(m{sup 2} day) at 85 °C and 85% relative humidity, and this value was maintained up to 15 000 h of aging time. The X-ray diffraction patterns revealed that the nanolaminated film was composed of an amorphous phase. A mixed phase was observed upon performing high resolution transmission electron microscope analysis, which indicated that a thermodynamically stable structure was formed. It was revealed amorphous SiN/SiCN/SiN multilayer structures that are free from intermixed interface defects effectively block water vapor permeation into active layer.

• OSTI ID: 22314515
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 5 Vol. 105; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
AMORPHOUS STATE
CARBON NITRIDES
CHEMICAL VAPOR DEPOSITION
LAYERS
NANOSTRUCTURES
SILICON NITRIDES
WATER VAPOR
X-RAY DIFFRACTION