Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process

Journal Article · Mon Jun 03 00:00:00 EDT 2013 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4807793· OSTI ID:22162963

Malobabic, Sina; Jupe, Marco; Ristau, Detlev ^[1]

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1. Laser Component Department, Laser Zentrum Hannover e.V., Hollerithallee 8, 30149 Hannover (Germany)

Nowadays, Ion Beam Sputter (IBS) processes are very well optimized on an empirical basis. To achieve further progresses, a modification of the IBS process by guiding the coating material using an axial magnetic field and an additional electrical field has been studied. The electro-magnetic (EM) field leads to a significant change in plasma properties and deposition rate distributions, whereas an increase in deposition rate along the centerline of the axial EM field around 150% was observed. These fundamental studies on the prototype are the basis for the development of an applicable and workable design of a separation device.

• OSTI ID: 22162963
• Journal Information: Applied Physics Letters, Vol. 102, Issue 22; Other Information: (c) 2013 Copyright-Sign 2013 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BEAMS
DEPOSITION
DISTRIBUTION
ELECTRIC FIELDS
ELECTROMAGNETIC FIELDS
ION BEAMS
MAGNETIC FIELDS
MODIFICATIONS
PLASMA
SILICON
SOLENOIDS
SPUTTERING
TITANIUM