Growth of (111) oriented NiFe{sub 2}O{sub 4} polycrystalline thin films on Pt (111) via sol-gel processing
- Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695-7907 (United States)
- G. W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0405 (United States)
Polycrystalline NiFe{sub 2}O{sub 4} (NFO) thin films are grown on (111) platinized Si substrates via chemical solution processing. {theta}-2{theta} x-ray diffraction, x-ray pole figures and electron diffraction indicate that the NFO has a high degree of <111> uniaxial texture normal to the film plane. The texturing is initiated by nucleation of (111) planes at the Pt interface and is enhanced with decreasing film thickness. As the NFO magnetic easy-axis is <111>, the out-of-plane magnetization exhibits improved M{sub r}/M{sub s} and coercivity with respect to randomly oriented films on silicon substrates. The out-of-plane M{sub r}/M{sub s} ratio for (111) textured NFO thin film is improved from 30% in 150 nm-thick films to above 70% in 50 nm-thick films. The improved out-of-plane magnetic anisotropy is comparable to epitaxial NFO films of comparable thickness deposited by pulsed laser deposition and sputtering.
- OSTI ID:
- 22089457
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 6 Vol. 112; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
A comparative study of CoZrNb and NiFe targets in discharge and sputtering using plasma confining type and magnetron sputtering method
Epitaxial growth of (001) Al on (111) Si by vapor deposition