Chemical state mapping on material surfaces with X1A second generation scanning photoemission microscope (X1A SPEM-II)

Book · Sat Dec 30 23:00:00 EST 1995

OSTI ID:220787

Ko, C H; Kirz, J; Maier, K; Winn, B ^[1]; Ade, H ^[2]; Hulbert, S; Johnson, E ^[3]; Anderson, E ^[4]

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1. State Univ. of New York, Stony Brook, NY (United States). Dept. of Physics
2. North Carolina State Univ., Raleigh, NC (United States). Dept. of Physics
3. Brookhaven National Lab., Upton, NY (United States). National Synchrotron Light Source
4. Lawrence Berkeley Lab., CA (United States). Center for X-ray Optics

The second generation scanning photoelectron microscope at beamline X1A of the National Synchrotron Light Source (X1A SPEM-II) is designed for spatially resolved elemental and chemical analysis by x-ray photoelectron spectroscopy (XPS) on material surfaces. This microscope can focus photon energies between 300 to 800 eV with submicron spatial resolution. Multiple photoelectron images can be acquired simultaneously with the use of a hemispherical sector analyzer (HSA) with multi-channel detection (MCD), which enables a technique called parallel imaging for chemical state mapping (PICSM). The PICSM technique was demonstrated using a Si/SiO{sub 2} pattern.

• Research Organization: Brookhaven National Laboratory (BNL), Upton, NY
• DOE Contract Number: AC02-76CH00016; AC03-76SF00098
• OSTI ID: 220787
• Report Number(s): CONF-950793--; ISBN 0-8194-1875-7
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
CHEMICAL SHIFT
EXPERIMENTAL DATA
PHOTOELECTRON SPECTROSCOPY
SAMPLE PREPARATION
SILICON
SILICON OXIDES
X RADIATION