Compositional study of vacuum annealed Al doped ZnO thin films obtained by RF magnetron sputtering

Journal Article · Thu Sep 15 00:00:00 EDT 2011 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.3624787· OSTI ID:22054120

Shantheyanda, B P; Todi, V O; Sundaram, K B; Vijayakumar, A; Oladeji, I ^[1]

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1. Department of Electrical Engineering and Computer Science, University of Central Florida, Orlando, Florida 32816 (United States)

Aluminum doped zinc oxide (AZO) thin films were obtained by RF magnetron sputtering. The effects of deposition parameters such as power, gas flow conditions, and substrate heating have been studied. Deposited and annealed films were characterized for composition as well as microstructure using x ray photoelectron spectroscopy and x ray diffraction. Films produced were polycrystalline in nature. Surface imaging and roughness studies were carried out using SEM and AFM, respectively. Columnar grain growth was predominantly observed. Optical and electrical properties were evaluated for transparent conducting oxide applications. Processing conditions were optimized to obtain highly transparent AZO films with a low resistivity value of 6.67 x 10{sup -4}{Omega} cm.

• OSTI ID: 22054120
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 29, Issue 5; Other Information: (c) 2011 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM
ANNEALING
ATOMIC FORCE MICROSCOPY
DEPOSITION
DOPED MATERIALS
GAS FLOW
GRAIN GROWTH
HEATING
MAGNETRONS
MICROSTRUCTURE
POLYCRYSTALS
ROUGHNESS
SCANNING ELECTRON MICROSCOPY
SPUTTERING
THIN FILMS
X-RAY DIFFRACTION
X-RAY PHOTOELECTRON SPECTROSCOPY
ZINC OXIDES