Formation of Pd nanocrystals in titanium-oxide film by rapid thermal annealing of reactively cosputtered TiPdO films
Journal Article
·
· Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433 (China)
In this article, the authors report a novel method for preparation of Pd nanocrystals embedded in TiO{sub 2} film; i.e., the TiPdO films are first deposited by reactively cosputtering Ti and Pd targets in a plasma mixture of O{sub 2} and Ar, followed by rapid thermal annealing (RTA). The experimental results indicate that the TiPdO film with a high content of Pd is inclined to produce big nanocrystals. Furthermore, the higher the RTA temperature, the bigger the Pd nanocrystals become. In addition, our analyses of the x-ray photoelectron spectroscopy spectra reveal that PdO, PdO{sub 2}, Ti{sub 2}O{sub 3}, and TiO{sub 2} coexist in the as-deposited film, and the RTA at 600 deg. C leads to decomposition of the entire PdO{sub 2} and partial PdO, together with the growth of Pd nanocrystals. At the same time, the released oxygen oxidizes fully Ti{sub 2}O{sub 3} into TiO{sub 2} during the decomposition. As the RTA temperature is increased up to 900 deg. C, more and more PdO is decomposed and the Pd nanocrystals become bigger and bigger.
- OSTI ID:
- 22051167
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 2 Vol. 29; ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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