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Title: Structural properties of Bi{sub 2}Te{sub 3} and Bi{sub 2}Se{sub 3} topological insulators grown by molecular beam epitaxy on GaAs(001) substrates

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3655995· OSTI ID:22027784
; ; ;  [1];  [2];  [2];  [3]; ;  [4];  [5]
  1. Department of Physics, University of Notre Dame, Notre Dame, Indiana 46556 (United States)
  2. Department of Physics, Arizona State University, Tempe, Arizona 85287 (United States)
  3. Center for Photonics Innovation, Arizona State University, Tempe, Arizona 85287 (United States)
  4. Department of Physics, Purdue University, West Lafayette, Indiana 47907 (United States)
  5. Center for Neutron Research, NIST, Gaithersburg, Maryland 20899 (United States)

Thin films of Bi{sub 2}Te{sub 3} and Bi{sub 2}Se{sub 3} have been grown on deoxidized GaAs(001) substrates using molecular beam epitaxy. Cross-sectional transmission electron microscopy established the highly parallel nature of the Te(Se)-Bi-Te(Se)-Bi-Te(Se) quintuple layers deposited on the slightly wavy GaAs substrate surface and the different crystal symmetries of the two materials. Raman mapping confirmed the presence of the strong characteristic peaks reported previously for these materials in bulk form. The overall quality of these films reveals the potential of combining topological insulators with ferromagnetic semiconductors for future applications.

OSTI ID:
22027784
Journal Information:
Applied Physics Letters, Vol. 99, Issue 17; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English