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Title: Nanocrystals and quantum dots formed by high-dose ion implantation

Technical Report ·
DOI:https://doi.org/10.2172/219351· OSTI ID:219351
; ; ;  [1];  [2]; ; ; ;  [3]
  1. Oak Ridge National Lab., TN (United States)
  2. Oak Ridge Y-12 Plant, TN (United States)
  3. Fisk Univ., Nashville, TN (United States)

Ion implantation and thermal annealing have been used to produce a wide range of nanocrystals and quantum dots in amorphous (SiO{sub 2}) and crystalline (Al{sub 2}O{sub 3}) matrices. Nanocrystals of metals (Au), elemental semiconductors (Si and Ge), and even compound semiconductors (SiGe, CdSe, CdS) have been produced. In amorphous matrices, the nanocrystals are randomly oriented, but in crystalline matrices they are three dimensionally aligned. Evidence for photoluminescence and quantum confinement effects are presented.

Research Organization:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC05-96OR22464
OSTI ID:
219351
Report Number(s):
CONF-951155-106; ON: DE96008102; TRN: 96:010618
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: Jan 1996
Country of Publication:
United States
Language:
English