Efficient E-Beam Lithography Exposure Strategies for Diffractive X-ray Optics

Journal Article · Fri Sep 09 04:00:00 EDT 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3625312· OSTI ID:21608316

Guzenko, V A; Vila-Comamala, J; Gorelick, S; David, C ^[1]; Romijn, J ^[2]

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1. Paul Scherrer Institut, 5232 Villigen PSI (Switzerland)
2. Vistec Lithography B.V., 5684 PS Best (Netherlands)

Exposure of structures with rotational symmetry by means of electron beam lithography is not trivial, because the e-beam writers are usually designed to deal with the data defined in Cartesian coordinates. Fabrication of circular nanostructures like Fresnel zone plates (FZPs) for x-ray microscopy applications requires exposures with resolution well below 1 nm. Therefore, special attention has to be paid to the efficient exposure data preparation, which will guarantee required precision and allow keeping the exposure time low. In this article, we describe in detail an optimized strategy that was applied for exposure of FZPs by the Vistec EBPG5000Plus e-beam lithography tool. Direct programming of exposure files allowed us to use fully the capabilities of this e-beam writer to expose efficiently and reproducibly FZPs with desired characteristics in both positive and negative tone resists.

• OSTI ID: 21608316
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1365; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
77 NANOSCIENCE AND NANOTECHNOLOGY
BEAM OPTICS
BEAM TRANSPORT
BEAMS
CARTESIAN COORDINATES
COHERENT SCATTERING
COMPUTER CODES
COORDINATES
DIFFRACTION
ELECTROMAGNETIC RADIATION
ELECTRON BEAMS
FABRICATION
IONIZING RADIATIONS
LEPTON BEAMS
MASKING
MICROSCOPY
NANOSTRUCTURES
OPTICS
OPTIMIZATION
PARTICLE BEAMS
PHOTON BEAMS
PLATES
RADIATIONS
RESOLUTION
SCATTERING
SYMMETRY
X RADIATION
X-RAY DIFFRACTION