Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Progress in the fabrication of high aspect ratio zone plates by soft x-ray lithography.

Conference ·
DOI:https://doi.org/10.1117/12.451019· OSTI ID:799808
Soft x-ray lithography technology has been applied to fabrication of phase shifting Fresnel Zone Plate (FZP's) for hard x-rays. Effects of the exposure conditions, developing system, and electroplating process parameters on line width and aspect ratio have been analyzed. The process has been optimized and an aspect ratio of 11 has been achieved for 110 nm outermost zone width. SEM and AFM have been used for preliminary metrology of the FZPs. The FZP optical performance was characterized at 8 keV photon energy at the 2-ID-D beam line at the Advanced Photon Source. Focusing efficiencies of 23% for FZPs apertures to 100 microns and 18% for 150-micron-diameter apertures have been obtained. The parameters of the fabricated FZP are in good agreement with the predicted values.
Research Organization:
Argonne National Lab., IL (US)
Sponsoring Organization:
US Department of Energy (US)
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
799808
Report Number(s):
ANL/XFD/CP-106519
Country of Publication:
United States
Language:
English

Similar Records

Fabrication of hard x-ray phase zone plate by x-ray lithography
Journal Article · Sun Oct 31 23:00:00 EST 1993 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States) · OSTI ID:5824861

Fabrication of soft x-ray Fresnel zone plate on ultrathin membrane
Journal Article · Mon May 23 00:00:00 EDT 2016 · AIP Conference Proceedings · OSTI ID:22606378

One-dimensional Grazing Incidence Zone Plate For Focusing Soft X-rays
Journal Article · Wed May 12 00:00:00 EDT 2004 · AIP Conference Proceedings · OSTI ID:20652853