Development of X-ray Microscopy at IPOE

Journal Article · Fri Sep 09 00:00:00 EDT 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3625340· OSTI ID:21608283

Zhu, J; Mu, B; Huang, Q; Huang, C; Yi, S; Zhang, Z; Wang, F; Wang, Z; Chen, L ^[1]

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1. Institute of Precision Optical Engineering (IPOE), Physics Department, Tongji University, Shanghai 200092 (China)

In order to meet the different requirements of applications in synchrotron radiation and plasma diagnosis in China, focusing and imaging optics based on Kirkpatrick-Baez (KB) mirrors, compound refractive lenses (CRLs), and multilayer Laue lenses (MLLs) were studied in our lab. A one-dimensional KB microscope using mirrors with a dual-periodic multilayer coating was developed. The multilayer mirror can reflect both 4.75 keV (Ti K-line) and 8.05 keV (Cu K-line) simultaneously, which makes alignment easier. For hard x-ray microscopy, CRL was studied. Using a SU-8 resist planar parabolic CRL, a focal line of 28.8-{mu}m width was obtained. To focus hard x-rays to nanometer levels efficiently, an MLL was fabricated using a WSi{sub 2}/Si multilayer. The MLL consists of 324 alternating WSi{sub 2} and Si layers with a total thickness of 7.9 {mu}m. (Recently, a much thicker multilayer has been deposited with a layer number of n = 1582 and a total thickness of 27 {mu}m.) After deposition, the sample was sliced and polished into an approximate ideal aspect ratio (depth of the zone plate to outmost layer thickness); the measured results show an intact structure remains, and the surface roughness of the cross section is about 0.4 nm after grinding and polishing processes.

• OSTI ID: 21608283
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1365; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ALIGNMENT
ASPECT RATIO
BEAM OPTICS
BEAM TRANSPORT
BREMSSTRAHLUNG
DIMENSIONLESS NUMBERS
ELECTROMAGNETIC RADIATION
ENERGY RANGE
FOCUSING
HARD X RADIATION
IONIZING RADIATIONS
KEV RANGE
LAYERS
MICROSCOPY
MIRRORS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
PLATES
RADIATION SOURCES
RADIATIONS
REFRACTIVE INDEX
REFRACTORY METAL COMPOUNDS
SILICIDES
SILICON COMPOUNDS
SYNCHROTRON RADIATION
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN COMPOUNDS
TUNGSTEN SILICIDES
X RADIATION
X-RAY SOURCES