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Title: Epitaxial growth of Bi{sub 2}Se{sub 3} topological insulator thin films on Si (111)

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3585673· OSTI ID:21560263
; ; ; ; ;  [1];  [1];  [2];  [3];  [4]
  1. Department of Electrical Engineering, University of California, Los Angeles, California 90095 (United States)
  2. Advanced Light Source Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720 (United States)
  3. Department of Physics, University of California, Riverside, California 92521 (United States)
  4. Materials Engineering and Centre for Microcopy and Microanalysis, University of Queensland, Brisbane QLD 4072 (Australia)

In this paper, we report the epitaxial growth of Bi{sub 2}Se{sub 3} thin films on Si (111) substrate, using molecular beam epitaxy (MBE). We show that the as-grown samples have good crystalline quality, and their surfaces exhibit terracelike quintuple layers. Angel-resolved photoemission experiments demonstrate single-Dirac-conelike surface states. These results combined with the temperature- and thickness-dependent magneto-transport measurements, suggest the presence of a shallow impurity band. Below a critical temperature of {approx}100K, the surface states of a 7 nm thick film contribute up to 50% of the total conduction.

OSTI ID:
21560263
Journal Information:
Journal of Applied Physics, Vol. 109, Issue 10; Other Information: DOI: 10.1063/1.3585673; (c) 2011 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English