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Monolithic single GaN nanowire laser with photonic crystal microcavity on silicon

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3540688· OSTI ID:21518239
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  1. Center for Nanoscale Photonics and Spintronics, University of Michigan, Ann Arbor, Michigan 48109-2122 (United States)

Optically pumped lasing at room temperature in a silicon based monolithic single GaN nanowire with a two-dimensional photonic crystal microcavity is demonstrated. Catalyst-free nanowires with low density ({approx}10{sup 8} cm{sup -2}) are grown on Si by plasma-assisted molecular beam epitaxy. High resolution transmission electron microscopy images reveal that the nanowires are of wurtzite structure and they have no observable defects. A single nanowire laser fabricated on Si is characterized by a lasing transition at {lambda}=371.3 nm with a linewidth of 0.55 nm. The threshold is observed at a pump power density of {approx}120 kW/cm{sup 2} and the spontaneous emission factor {beta} is estimated to be 0.08.

OSTI ID:
21518239
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 2 Vol. 98; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English