The influence of aluminum grain size on alumina nanoporous structure

Journal Article · Fri Jan 15 04:00:00 EST 2010 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3291115· OSTI ID:21476117

Feil, A F; Costa, M V. da; Amaral, L; Teixeira, S R ^[1]; Migowski, P; Dupont, J ^[2]; Machado, G ^[3]; Peripolli, S B ^[4]

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1. Instituto de Fisica, Universidade Federal do Rio Grande do Sul, UFRGS, Avenida Bento Goncalves 9500, P.O. Box 15051, 91501-970 Porto Alegre, RS (Brazil)
2. Instituto de Quimica, Universidade Federal do Rio Grande do Sul, UFRGS, Avenida Bento Goncalves 9500, P.O. Box 15003, 91501-970 Porto Alegre, RS (Brazil)
3. Departamento de Engenharia Quimica, Universidade de Caxias do Sul, UCS, Caxias do Sul, RS (Brazil)
4. Instituto Nacional de Metrologia, INMETRO, DIMAT, av. Nossa Senhora das Gracas 50, Xerem, 25250-020, Duque de Caxias, RJ (Brazil)

An approach to control the interpore distances and nanopore diameters of 150-nm-thick thin aluminum films is reported here. The Al thin films were grown by sputtering on p-type silicon substrate and anodized with a conventional anodization process in a phosphoric acid solution. It was found that interpore distance and pore diameter are related to the aluminum grain size and can be controlled by annealing. The grain contours limit the sizes of alumina cells. This mechanism is valid for grain sizes supporting only one alumina cell and consequently only one pore.

• OSTI ID: 21476117
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 2 Vol. 107; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
ANNEALING
ANODIZATION
CHALCOGENIDES
CHEMICAL COATING
CORROSION PROTECTION
DEPOSITION
ELECTROCHEMICAL COATING
ELECTROLYSIS
ELEMENTS
FILMS
GRAIN SIZE
HEAT TREATMENTS
HYDROGEN COMPOUNDS
INORGANIC ACIDS
INORGANIC COMPOUNDS
LYSIS
MATERIALS
METALS
MICROSTRUCTURE
OXIDES
OXYGEN COMPOUNDS
P-TYPE CONDUCTORS
PHOSPHORIC ACID
PHOSPHORUS COMPOUNDS
POROUS MATERIALS
SEMICONDUCTOR MATERIALS
SEMIMETALS
SILICON
SIZE
SPUTTERING
SUBSTRATES
SURFACE COATING
THIN FILMS