Observation of isolated nanopores formed by patterned anodic oxidation of aluminum thin films

Journal Article · Mon Jun 05 04:00:00 EDT 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2212535· OSTI ID:20779391

Qiyu, Huang; Lye, W -K; Reed, Michael L ^[1]

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1. School of Microelectronics, Shanghai Jiaotong University, 1954 Huashan Road, Shanghai 200030 (China)

We report the formation of confined nanometer-scale regions of porous anodic alumina from thin aluminum films. Confinement is achieved by masking a thin Al film with a sputtered SiO{sub 2} layer, patterned by nanoimprint lithography of a polystyrene transfer layer. Anodization in 0.3 molar oxalic acid creates vertically aligned pores that were imaged with a combination of focused ion beam milling and scanning electron microscopy. Triplets, pairs, and single pores were observed following the anodization of isolated mask features approximately 100 nm in diameter.

• OSTI ID: 20779391
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 23 Vol. 88; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM
ALUMINIUM OXIDES
ANODIZATION
ION BEAMS
LAYERS
MILLING
OXALIC ACID
OXIDATION
POLYSTYRENE
POROUS MATERIALS
SCANNING ELECTRON MICROSCOPY
SILICON OXIDES
THIN FILMS