Analysis of optical emission spectroscopy in a dual-frequency capacitively coupled CHF{sub 3} plasma
- Jiangsu Key Laboratory of Thin Films, School of Physical Science and Technology, Soochow University, Suzhou 215006 (China)
The characteristics of a capacitively coupled CHF{sub 3} plasma driven by dual-frequency sources (41 MHz/2 MHz) are experimentally investigated by using optical emission spectroscopy technique. The dependences of relative densities of F and H, the ratio of F/CF{sub 2}, and the excitation temperature, as well as neutral gas rotational temperature on the low or high frequency (LF or HF) power, have been analyzed. It is found that the increment rate of the gas dissociation rate, the ratio of F/CF{sub 2}, the excitation temperature. and the neutral gas temperature with increasing LF power are larger than that of HF power. The relative densities of F and H, the ratio of F/CF{sub 2}, and the excitation temperature decrease while the neutral gas temperature increases with increasing gas pressure.
- OSTI ID:
- 21277040
- Journal Information:
- Physics of Plasmas, Vol. 16, Issue 4; Other Information: DOI: 10.1063/1.3122937; (c) 2009 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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