Spectroscopy diagnostic of dual-frequency capacitively coupled CHF{sub 3}/Ar plasma
- Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024 (China)
- School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)
A combined spectroscopic method of absorption, actinometry, and relative optical emission intensity is employed to determine the absolute CF{sub 2} density, the relative F and H densities, H atom excitation temperature and the electron density in dual-frequency (60/2 MHz) capacitively coupled CHF{sub 3}/Ar plasmas. The effects of different control parameters, such as high-frequency (HF) power, low-frequency (LF) power, gas pressure, gap length and content of CHF{sub 3}, on the concentration of radical CF{sub 2}, F, and H and excitation temperature are discussed, respectively. It is found that the concentration of CF{sub 2} is strongly dependent on the HF power, operating pressure and the proportion of CHF{sub 3} in feed gas, while it is almost independent of the LF power and the gap length. A higher concentration ratio of F to CF{sub 2} could be obtained in dual-frequency discharge case. Finally, the generation and decay mechanisms of CF{sub 2} and F were also discussed.
- OSTI ID:
- 22218454
- Journal Information:
- Physics of Plasmas, Vol. 20, Issue 11; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
74 ATOMIC AND MOLECULAR PHYSICS
ARGON
ATOMS
CARBON COMPOUNDS
CONCENTRATION RATIO
ELECTRON DENSITY
ELECTRON TEMPERATURE
EMISSION SPECTROSCOPY
EXCITATION
EXCITED STATES
FLUORINE
FLUOROFORM
HYDROGEN
ION TEMPERATURE
MHZ RANGE
PHOTON-ATOM COLLISIONS
PHOTON-MOLECULE COLLISIONS
PLASMA DENSITY
PLASMA DIAGNOSTICS
PLASMA PRESSURE