Control of the discharge chemistry of CHF{sub 3} in dual-frequency capacitively coupled plasmas

Journal Article · Mon Aug 18 00:00:00 EDT 2008 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2973402· OSTI ID:21124083

Yuan, Q H; Ye, C; Xin, Y; Huang, X J; Ning, Z Y ^[1]; Yin, G Q ^[2]

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1. Department of Physics, Soochow University, Suzhou 215006 (China)
2. SiChuan University of Science and Engineering, ZiGong 643000 (China)

The discharge chemistry of CHF{sub 3} in 27/2, 60/2, and 60/13.56 MHz dual-frequency capacitively coupled plasmas (DF-CCPs) is studied with actinometric optical emission spectroscopy and mass spectrometry. The frequency effect on the generation of reactive species was investigated. The reactive radicals and the density ratio of F/CF{sub 2} could be controlled by the 2 MHz rf power in 27/2 and 60/2 MHz DF-CCPs. The density ratios of F/CF{sub 2} in 27/2 and 60/2 MHz DF-CCPs are observed to increase with an increase in low-frequency power. However, this control could not be obtained in 60/13.56 MHz DF-CCP.

• OSTI ID: 21124083
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 7 Vol. 93; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CHEMICAL ANALYSIS
ELECTRIC DISCHARGES
EMISSION SPECTROSCOPY
FLUOROFORM
MASS SPECTROSCOPY
MHZ RANGE 01-100
PLASMA
PLASMA DIAGNOSTICS
RADICALS