Characteristics of rf H{sup -} Ion Source by Using FET Power Source

Journal Article · Thu Mar 12 04:00:00 EDT 2009 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3112524· OSTI ID:21269110

Ando, A; Moon, C H; Komuro, J ^[1]; Tsumori, K; Takeiri, Y ^[2]

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1. Graduate School of Engineering, Tohoku University, Aoba-yama, Sendai, 980-8579 (Japan)
2. National Institute for Fusion Science, Oroshi-cho, Toki, 509-5292 (Japan)

Characteristics of radio frequency(rf) plasma production are investigated using a FET inverter power supply as an rf generator. The matching circuit in the inverter system is simple compared to a conventional 50 Ohm matching system and only an imaginary part of the impedance of rf transmission should be matched by adjusting operating frequency or capacitance of the circuit. An electron density over 10{sup 18} m{sup -3} is produced in argon plasma with 1 kW rf power. Lower densities are obtained in helium and hydrogen plasmas compared to the argon plasma. Effect of axial magnetic field in driver region is examined. Electron density more than 10{sup 18} m{sup -3} is obtained at the hydrogen gas pressure around 1 Pa with the help of the axial magnetic field.

• OSTI ID: 21269110
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1097; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON
CAPACITANCE
ELECTRON DENSITY
FIELD EFFECT TRANSISTORS
HELIUM
HYDROGEN
HYDROGEN IONS 1 MINUS
IMPEDANCE
INVERTERS
ION SOURCES
MAGNETIC FIELDS
PLASMA
PLASMA BEAM INJECTION
PLASMA HEATING
PLASMA PRODUCTION
RADIOWAVE RADIATION