A multi-sample Cs-sputter negative-ion source

Journal Article · Mon Apr 26 04:00:00 EDT 1999 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.58955· OSTI ID:21205472

Alton, G D; Cui, B; Bao, Y; Reed, C A; Ball, J A; Williams, C ^[1]

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1. Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, Tennessee 37831-6368 (United States)

A multi-sample Cs sputter negative-ion source, equipped with a conical-geometry, W-surface-ionizer has been designed and fabricated that permits sample changes without disruption of on-line accelerator operation. Sample changing is effected by actuating an electro-pneumatic control system located at ground potential that drives an air-motor-driven sample-indexing-system mounted at high voltage; this arrangement avoids complications associated with indexing mechanisms that rely on electronic power-supplies located at high potential. In-beam targets are identified by LED indicator lights derived from a fiber-optic, Gray-code target-position sensor. Aspects of the overall source design and details of the indexing mechanism along with operational parameters, ion optics, intensities, and typical emittances for a variety of negative-ion species will be presented in this report.

• OSTI ID: 21205472
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 473; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ACCELERATORS
ANIONS
BEAM EMITTANCE
BEAM OPTICS
BEAM PRODUCTION
CONTROL SYSTEMS
DESIGN
ELECTRIC POTENTIAL
ION BEAMS
OPERATION
POWER SUPPLIES
SENSORS
SPUTTERING
TARGET CHAMBERS