Multi-sample negative ion source

Journal Article · Fri Mar 01 04:00:00 EST 1996 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.1146741· OSTI ID:434578

Gelbart, W Z ^[1]; Johnson, R R ^[2]; Paul, M ^[3]; Shahar, Y ^[4]; Schubank, R B; Cifarelli, F ^[1]

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1. Triumf, Vancouver, British Columbia (Canada)
2. University of British Columbia, Vancouver, British Columbia (Canada)
3. Rakah Institute, Jerusalem (Israel)
4. The Weitzman Institute, Rehovot (Israel)

A cesium sputter, negative ion source was developed and built at Triumf. While designed for accelerator mass spectrometry, it can be applied in any field requiring intensive negative ion beams covering the whole range from hydrogen to uranium. The source features an internal cesium oven and simplified target insulation. A pneumatically actuated target changer contains a 28-sample wheel but allows manual placing of single samples as well. In initial runs the source produced over 1 {mu}A of {sup 40}CaH{sup {minus}}{sub 3} and .25 {mu}A of {sup 27}Al{sup {minus}} beams. The construction of the source and the operation of the sample changer are discussed in this article. {copyright} {ital 1996 American Institute of Physics.}

• OSTI ID: 434578
• Report Number(s): CONF-9509125--
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 3 Vol. 67; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

66 PHYSICS
ANIONS
DESIGN
ION SOURCES
KEV RANGE 01-10
MICRO AMP BEAM CURRENTS
SAMPLE CHANGERS
SPUTTERING
TEMPERATURE RANGE 1000-4000 K