Characterization of ZnO plasma in a radio frequency sputtering system

Journal Article · Sun Jun 15 04:00:00 EDT 2008 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2948940· OSTI ID:21137356

Joshy, N V; Jayaraj, M K ^[1]; Isaac, Johney ^[2]

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1. Optoelectronic Devices Laboratory, Department of Physics, Cochin University of Science and Technology, Kochi 682 022 (India)
2. Department of Instrumentation, Cochin University of Science and Technology, Kochi 682 022 (India)

Plasma generated by the radio frequency (rf) magnetron sputtering of gallium doped zinc oxide (ZnO) has been studied using cylindrical Langmuir probe and optical emission spectroscopy. The electron density and electron temperature were calculated for various rf powers at different spatial positions along the propagation direction of the plume. The electron density was found to increase with argon gas pressure whereas electron temperature decreased. The focusing of the plasma due to the magnetic field of the magnetron was observed at 3 cm distance from the target at low rf powers, while shift in the focusing of the plume was observed for high sputtering powers. Plasma potential of the plume was also evaluated at all sputtering conditions and its spatial variations were studied. Optical emission spectra of the plume were recorded at various spatial positions of the plume to get qualitative estimate of species in the plasma at various sputtering conditions. ZnO thin films were deposited on glass substrates placed at 3 and 6 cm distances from the target at different sputtering conditions. X-ray diffraction and scanning electron microscopy studies were carried out to investigate the crystallographic properties and the surface morphology of films deposited at these distances in relation to the plasma parameters.

• OSTI ID: 21137356
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 12 Vol. 103; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON
CRYSTALLOGRAPHY
DOPED MATERIALS
ELECTRON DENSITY
ELECTRON TEMPERATURE
EMISSION SPECTRA
EMISSION SPECTROSCOPY
GALLIUM
LANGMUIR PROBE
MAGNETIC FIELDS
MAGNETRONS
MORPHOLOGY
PLASMA
PLASMA POTENTIAL
RADIOWAVE RADIATION
SCANNING ELECTRON MICROSCOPY
SPUTTERING
THIN FILMS
X-RAY DIFFRACTION
ZINC OXIDES