CoCrPt-SiO{sub 2} granular-type longitudinal media on Ru underlayer for sputtered tape applications

Journal Article · Tue Apr 01 00:00:00 EDT 2008 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2885068· OSTI ID:21137334

Lee, Hwan-Soo; Jiangang, Zhu; Laughlin, David E ^[1]

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1. Data Storage Systems Center, Department of Electrical and Computer Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213 (United States)

CoCrPt-SiO{sub 2} films for use as thin film tape media have been investigated. Bias sputtering and high Ar pressure were utilized to achieve desirable media properties (good in-plane orientation and enhanced grain decoupling) in these media. The in-plane orientation of the bias sputtered CoCrPt-SiO{sub 2} magnetic layer was well maintained even at a high content of SiO{sub 2} as Ru was used as an underlayer and deposited at high Ar pressure. Films of (10.0) textured CoCrPt-SiO{sub 2} on a Ru underlayer showed a large in-plane coercivity of 4000 Oe and transmission electron microscopy revealed an average grain size of about 10 nm, well decoupled by the oxide. The in-plane coercivity was a strong function of the Ru thickness.

• OSTI ID: 21137334
• Journal Information: Journal of Applied Physics, Vol. 103, Issue 7; Conference: 52. annual conference on magnetism and magnetic materials, Tampa, FL (United States), 5-9 Nov 2007; Other Information: DOI: 10.1063/1.2885068; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHROMIUM ALLOYS
COBALT ALLOYS
COERCIVE FORCE
DEPOSITION
GRAIN ORIENTATION
GRAIN SIZE
MAGNETIC TAPES
PLATINUM ALLOYS
RUTHENIUM
SILICON OXIDES
SPUTTERING
TEXTURE
THICKNESS
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY