skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering

Journal Article · · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
DOI:https://doi.org/10.1116/1.2839855· OSTI ID:21124025
; ;  [1]
  1. NanoTechnology Centre for PVD Research, Materials and Engineering Research Institute, Howard Street, Sheffield Hallam University, Sheffield S1 1WB (United Kingdom)

Nanoscale multilayer CrN/NbN physical vapor deposition (PVD) coatings are gaining reputation for their high corrosion and wear resistance. However, the CrN/NbN films deposited by ABS (arc bond sputtering) technology have some limitations such as macrodroplets, porosity, and less dense structures. The novel HIPIMS (high power impulse magnetron sputtering) technique produces macroparticle-free, highly ionized metal plasma, which brings advantages in both surface pretreatment and coating deposition stages of the PVD process. In this study, nanoscale multilayer CrN/NbN PVD coatings were pretreated and deposited with HIPIMS technology and compared with those deposited by HIPIMS-UBM (unbalanced magnetron) and by the ABS technique. In all cases Cr{sup +} etching was utilized to enhance adhesion by low energy ion implantation. The coatings were deposited at 400 deg. C with substrate biased (U{sub b}) at -75 V. During coating deposition, HIPIMS produced significantly high activation of nitrogen compared to the UBM as observed with mass spectroscopy. HIPIMS-deposited coatings revealed a bilayer period of 4.1 nm (total thickness: 2.9 {mu}m) and hardness of 3025 HK{sub 0.025}. TEM results revealed droplet free, denser microstructure with (200) preferred orientation for the HIPIMS coating owing to the increased ionization as compared to the more porous structure with random orientation observed in UBM coating. The dry sliding wear coefficient (K{sub c}) of the coating was 1.8x10{sup -15} m{sup 3} N{sup -1} m{sup -1}, whereas the steady state coefficient of friction was 0.32. Potentiodynamic polarization tests revealed higher E{sub corr} values, higher pitting resistance (around potentials +400 to +600 mV), and lower corrosion current densities for HIPIMS deposited coatings as compared to the coatings deposited by ABS or HIPIMS-UBM. The corrosion behavior of the coatings qualitatively improved with the progressive use of HIPIMS from pretreatment stage to the coating deposition step.

OSTI ID:
21124025
Journal Information:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 26, Issue 2; Other Information: DOI: 10.1116/1.2839855; (c) 2008 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
Country of Publication:
United States
Language:
English

Similar Records

ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques
Journal Article · Thu May 15 00:00:00 EDT 2014 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:21124025

Structure and properties of ZrN coatings deposited by high power impulse magnetron sputtering technology
Journal Article · Sat Jan 15 00:00:00 EST 2011 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films · OSTI ID:21124025

Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films
Journal Article · Tue May 15 00:00:00 EDT 2007 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films · OSTI ID:21124025