Focusing of hard x-rays to 16 nanometers with a multilayer Laue lens

Journal Article · Mon Jun 02 00:00:00 EDT 2008 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2912503· OSTI ID:21120768

Kang, Hyon Chol; Hanfei, Yan; Winarski, Robert P; Holt, Martin V; Maser, Joerg ^[1]; Chian, Liu; Conley, Ray; Vogt, Stefan; Macrander, Albert T ^[2]; Stephenson, G Brian ^[3]

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1. Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
2. X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
3. Materials Science Division and Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439 (United States)

We report improved results for hard x-ray focusing using a multilayer Laue lens (MLL). We have measured a line focus of 16 nm width with an efficiency of 31% at a wavelength {lambda}=0.064 nm (19.5 keV) using a partial MLL structure with an outermost zone width of 5 nm. The results are in good agreement with the theoretically predicted performance.

• OSTI ID: 21120768
• Journal Information: Applied Physics Letters, Vol. 92, Issue 22; Other Information: DOI: 10.1063/1.2912503; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
EFFICIENCY
FOCUSING
HARD X RADIATION
KEV RANGE 10-100
LAYERS
LENSES
OPTICS
PERFORMANCE
WAVELENGTHS
X-RAY DIFFRACTION