Optical behavior of reactive sputtered carbon nitride films during annealing
Journal Article
·
· Journal of Applied Physics
- Laboratoire de Physique de la Matiere Condensee, Faculte des Sciences d'Amiens, 33 Rue Saint Leu, 80039 Amiens Cedex 2 (France)
The effect of annealing temperature (T{sub A}) on amorphous carbon nitride (a-CN{sub x}) thin films, deposited using radio-frequency (rf) magnetron sputtering technique of a graphite target in a pure nitrogen (N{sub 2}) atmosphere at different rf power, is investigated. Film composition was analyzed using Fourier transform infrared absorption (FTIR), Raman spectroscopy, optical transmission, and photothermal deflection spectroscopy (PDS) experiments. The refractive index and the mass density were determined using optical transmission spectroscopy and elastic recoil detection analysis measurements. The microstructure analysis revealed the porous character of films, which decreases slowly with increasing annealing temperature (T{sub A}). The results of Raman spectroscopy, FTIR, and PDS experiments demonstrate that the films below 400 deg. C mainly consist of aromatic cluster component and polymeric component. With increasing T{sub A}, the progressive graphitization of the material is accompanied by a high disorder form of Csp{sup 2} sites.
- OSTI ID:
- 21064493
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 1 Vol. 103; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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