Inspection of a Spherical Triple VLS-Grating for Self-Seeding of FLASH at DESY
Journal Article
·
· AIP Conference Proceedings
- BESSY mbH, Albert-Einstein-Strasse. 15, 12489 Berlin (Germany)
- DESY, Notkestrasse 85, 22607 Hamburg (Germany)
- Scientific Answers and Solutions, 5708 Restal St., Madison, WI 53711 (United States)
To take benefit from the improved brilliance of the laser-like source, proposed beamlines at Free Electron Lasers (FEL) require optical elements of excellent precision, characterised by slope errors beyond the state of the art limit of 0.5{mu}rad rms for plane and spherical shape. Part of the monochromator beamline for self-seeding at the vacuum-ultraviolet Free Electron Laser (FLASH) at DESY is a triple Variable Line Spacing (VLS) grating of spherical shape. The three grating structures on a common substrate will cover the wavelength range from 6.4 to 60nm The challenging specifications of these grating structures are characterised by a slope error of less than 0.25{mu}rad rms and very stringent parameters for the VLS-polynomial. These grating structures have been measured by use of the Nano Optic Measuring Machine (NOM) at BESSY. Based on the principle of deflectometry the BESSY-NOM represents the latest generation of slope measuring metrology instruments. The NOM enables the inspection of optical components with a measurement uncertainty in the range of 0.05{mu}rad rms. This is a five to tenfold improvement compared to state of the art metrology tools of today. Here it is demonstrated how these outstanding metrology capabilities have been applied for a sound characterisation of a challenging precision optical component with error limits five times below the specifications. In the shown example the grating's figure accuracy has been characterised by linescans and surface mapping measurements of the optical active sections. In additional measurements under Littrow condition the higher order diffraction signals of the laser pencil beam have been traced to measure the groove density variation of the different grating-structures with a lateral resolution of 1mm. In contrast to the sparse and point like measurements of the manufacturer, these high resolution measurements yield a 'slope deviation equivalent' resulting from imperfections in the line density variation.
- OSTI ID:
- 21052604
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 879; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
Similar Records
Sub-microradian Surface Slope Metrology with the ALS Developmental Long Trace Profiler
Non-null full field X-ray mirror metrology using SCOTS: a reflection deflectometry approach
The Nanometer Optical Component Measuring Machine: a new Sub-nm Topography Measuring Device for X-ray Optics at BESSY
Conference
·
Mon Jun 15 00:00:00 EDT 2009
·
OSTI ID:962723
Non-null full field X-ray mirror metrology using SCOTS: a reflection deflectometry approach
Journal Article
·
Wed May 16 00:00:00 EDT 2012
· Optics Express
·
OSTI ID:1049291
The Nanometer Optical Component Measuring Machine: a new Sub-nm Topography Measuring Device for X-ray Optics at BESSY
Journal Article
·
Wed May 12 00:00:00 EDT 2004
· AIP Conference Proceedings
·
OSTI ID:20653085