Metrology for Grayscale Lithography
Journal Article
·
· AIP Conference Proceedings
- Microelectronics Research Center, Georgia Institute of Technology, 791 Atlantic Dr NW, Atlanta GA 30332 (United States)
Three dimensional microstructures find applications in diffractive optical elements, photonic elements, etc. and can be efficiently fabricated by grayscale lithography. Good process control is important for achieving the desired structures. Metrology methods for grayscale lithography are discussed. Process optimization for grayscale e-beam lithography is explored and various process parameters that affect the grayscale process are discussed.
- OSTI ID:
- 21032727
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 931; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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