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Large-Scale Metasurfaces Based on Grayscale Nanosphere Lithography

Journal Article · · ACS Photonics

Metasurfaces, based on subwavelength structuring, provide a versatile platform for wavefront manipulation in an ultrathin form factor. The manufacturing of metasurfaces, however, generally requires fabrication techniques, such as electron-beam lithography, that are not scalable. One alternative is the use of ultraviolet steppers, but these require significant capital investment and there are challenges in handling the large mask sizes that metasurfaces demand due to the structuring density. In this paper, we propose and demonstrate a novel manufacturing method based on self-assembly of nanospheres in combination with grayscale lithography. This technique enables large-scale metasurfaces with nonperiodic phase profiles while being cost-effective. As a proof of concept, we demonstrate a series of large-scale (1 mm diameter) metalenses demonstrating diffraction-limited focusing as well as holograms. This approach could open new doors to cost-effective and large-scale fabrication of a wide range of metasurface-based optics.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1807245
Journal Information:
ACS Photonics, Journal Name: ACS Photonics Journal Issue: 6 Vol. 8; ISSN 2330-4022
Publisher:
American Chemical Society (ACS)Copyright Statement
Country of Publication:
United States
Language:
English

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  • Han, Shuo; Hao, Zhibiao; Wang, Jian
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