Fabrication and evaluation of a wideband multilayer laminar-type holographic grating for use with a soft-x-ray flat-field spectrograph in the region of 1.7 keV
A multilayer laminar-type holographic grating having an average groove density of2400 lines/mmis designed and fabricated for use with a soft-x-ray flat-field spectrograph covering the0.70-0.75 nm region. A varied-line-spaced groove pattern is generated by the use of an aspheric wavefront recording system, and laminar-type grooves are formed by a reactive ion-etching method.Mo/SiO2 multilayers optimized for the emission lines of Hf-M,Si-K, and W-M are deposited on one of the three designated areas on the grating surface in tandem. The measured first-order diffraction efficiencies at the respective centers of the areas are 18%-20%. The flat-field spectrograph equipped with the grating indicates a spectral linewidth of8-14 eV for the emission spectra generated from electron-impact x-ray sources.
- OSTI ID:
- 21013649
- Journal Information:
- Applied Optics, Journal Name: Applied Optics Journal Issue: 28 Vol. 46; ISSN 0003-6935; ISSN APOPAI
- Country of Publication:
- United States
- Language:
- English
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