Efficiency of a multilayer-coated, ion-etched laminar holographic grating in the 14.5{endash}16.0-nm wavelength region
- Naval Research Laboratory, Washington, D.C. 20375 (United States)
- Carl Zeiss, P.O. Box 1369, D-73446, Oberkochen (Germany)
- Faculty of Physics, University of Bielefeld, P.O. Box 100131, D-33615, Bielefeld (Germany)
- SFA, Inc., 1401 McCormick Drive, Largo, Maryland 20774 (United States)
The efficiency of an ion-etched laminar holographic grating was measured at near-normal incidence in the 14.5{endash}16.0-nm wavelength range. The grating had an electron-beam-evaporated Mo/Si multilayer coating matched to the grating groove depth. The efficiency peaked at 16.3{percent} in the first inside order at 15.12nm and 15.0{percent} in the first outside order at 14.94nm. These are believed to be the highest efficiencies obtained to date from a multilayer-coated laminar grating at near-normal incidence in the EUV ({lambda}{lt}30.0 nm). Zero and even orders were almost completely suppressed. The grating groove efficiency in the first order approached the theoretical limit of 40.5{percent}. {copyright} {ital 1997} {ital Optical Society of America}
- Research Organization:
- Brookhaven National Laboratory
- DOE Contract Number:
- AC02-76CH00016
- OSTI ID:
- 509019
- Journal Information:
- Optics Letters, Journal Name: Optics Letters Journal Issue: 11 Vol. 22; ISSN OPLEDP; ISSN 0146-9592
- Country of Publication:
- United States
- Language:
- English
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