Quantitative evaluation of film thickness uniformity: Application to off-axis magnetron source onto a rotating substrate
- State Key Lab of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China (UESTC), Chengdu, 610054 (China) and School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu, 610054 (China)
To predict the thin film thickness distribution in a quantitative way, a theoretical calculation was conducted according to the cosine law approach for off-axis sputtering. The numerical calculation was focused on the optimal geometry instead of the thickness distribution itself, which took into account several variables including the target-to-substrate distance, the off-axis displacement, the emission characteristic, the width of the erosion groove, and the film thickness requirement. The effects of these variables on the optimal geometry were analyzed individually and the subsequent combined equations for optimal geometry were summarized. Thus, the combined equations were multivariable functions. These equations were simple and general and could be applied directly. For many situations, these equations eliminate the need to perform the complex, detailed calculation otherwise needed for each deposition geometry variant.
- OSTI ID:
- 20979380
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 25, Issue 2; Other Information: DOI: 10.1116/1.2429677; (c) 2007 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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