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Title: Interface chemistry and epitaxial growth modes of SrF{sub 2} on Si(001)

Journal Article · · Physical Review. B, Condensed Matter and Materials Physics
 [1]; ; ; ;  [2];  [3];  [1]
  1. Dipartimento di Ingegneria dei Materiali e dell'Ambiente, Universita di Modena e Reggio Emilia, Via Vignolese 905, 41100-Modena (Italy)
  2. RAS, Solid State Optics Department, Ioffe Physical-Technical Institute, 26 Polytechnicheskaya, 194021 St. Petersburg, (Russian Federation)
  3. INFM-CNR-TASC Laboratory, s.s. 14, km 163.5 in AREA Science Park, 34012 Basovizza (Italy)

Molecular beam epitaxy has been used to grow SrF{sub 2} thin films on Si(001). The growth modes have been investigated by atomic force microscopy, electron diffraction, and photoemission. Two principal growth regimes have been identified: (i) when deposition is carried out with the substrate held at a temperature of 700-750 deg. C, SrF{sub 2} molecules react with the substrate giving rise to a Sr-rich wetting layer on top of which three dimensional bulklike fluoride ridges develop; (ii) when deposition is carried out with the substrate held at 400 deg. C, a nanopatterned film forms with characteristic triangular islands. Results are compared to the growth mode of CaF{sub 2} on Si(001) under analogous deposition conditions. Morphological and structural differences between the two systems are associated with the larger lattice parameter of SrF{sub 2} with respect to CaF{sub 2}, resulting in a larger mismatch with the Si substrate.

OSTI ID:
20976701
Journal Information:
Physical Review. B, Condensed Matter and Materials Physics, Vol. 75, Issue 7; Other Information: DOI: 10.1103/PhysRevB.75.075403; (c) 2007 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1098-0121
Country of Publication:
United States
Language:
English