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Title: Thin film deposition on powder surfaces using atmospheric pressure discharge

Abstract

The deposition of SiOx containing films on NaCl and KBr particles in dielectric barrier discharge under atmospheric pressure was investigated. As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon-oxygen gas mixtures were used. The deposited layers were studied by means of light microscopy, SEM and XPS investigations. The particles could be completely covered by SiOx. With increasing oxygen content in the coating the carbon content decreases.

Authors:
; ;  [1]
  1. Institute for Low Temperature Plasma Physics, F.-L.-Jahn-Str.19, 17489 Greifswald (Germany)
Publication Date:
OSTI Identifier:
20726784
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 799; Journal Issue: 1; Conference: 4. international conference on the physics of dusty plasmas, Orleans (France), 13-17 Jun 2005; Other Information: DOI: 10.1063/1.2134635; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ARGON; ATMOSPHERIC PRESSURE; CARBON; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; MIXTURES; OXYGEN; OXYGEN COMPOUNDS; PARTICLES; PLASMA; POTASSIUM BROMIDES; POWDERS; PRECURSOR; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SODIUM CHLORIDES; SURFACES; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY

Citation Formats

Brueser, V., Haehnel, M., and Kersten, H. Thin film deposition on powder surfaces using atmospheric pressure discharge. United States: N. p., 2005. Web. doi:10.1063/1.2134635.
Brueser, V., Haehnel, M., & Kersten, H. Thin film deposition on powder surfaces using atmospheric pressure discharge. United States. doi:10.1063/1.2134635.
Brueser, V., Haehnel, M., and Kersten, H. Mon . "Thin film deposition on powder surfaces using atmospheric pressure discharge". United States. doi:10.1063/1.2134635.
@article{osti_20726784,
title = {Thin film deposition on powder surfaces using atmospheric pressure discharge},
author = {Brueser, V. and Haehnel, M. and Kersten, H.},
abstractNote = {The deposition of SiOx containing films on NaCl and KBr particles in dielectric barrier discharge under atmospheric pressure was investigated. As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon-oxygen gas mixtures were used. The deposited layers were studied by means of light microscopy, SEM and XPS investigations. The particles could be completely covered by SiOx. With increasing oxygen content in the coating the carbon content decreases.},
doi = {10.1063/1.2134635},
journal = {AIP Conference Proceedings},
number = 1,
volume = 799,
place = {United States},
year = {Mon Oct 31 00:00:00 EST 2005},
month = {Mon Oct 31 00:00:00 EST 2005}
}