Thin film deposition on powder surfaces using atmospheric pressure discharge

Journal Article · Mon Oct 31 00:00:00 EST 2005 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.2134635· OSTI ID:20726784

Brueser, V; Haehnel, M; Kersten, H ^[1]

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1. Institute for Low Temperature Plasma Physics, F.-L.-Jahn-Str.19, 17489 Greifswald (Germany)

The deposition of SiOx containing films on NaCl and KBr particles in dielectric barrier discharge under atmospheric pressure was investigated. As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon-oxygen gas mixtures were used. The deposited layers were studied by means of light microscopy, SEM and XPS investigations. The particles could be completely covered by SiOx. With increasing oxygen content in the coating the carbon content decreases.

• OSTI ID: 20726784
• Journal Information: AIP Conference Proceedings, Vol. 799, Issue 1; Conference: 4. international conference on the physics of dusty plasmas, Orleans (France), 13-17 Jun 2005; Other Information: DOI: 10.1063/1.2134635; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ARGON
ATMOSPHERIC PRESSURE
CARBON
DEPOSITION
DIELECTRIC MATERIALS
ELECTRIC DISCHARGES
MIXTURES
OXYGEN
OXYGEN COMPOUNDS
PARTICLES
PLASMA
POTASSIUM BROMIDES
POWDERS
PRECURSOR
SCANNING ELECTRON MICROSCOPY
SILICON COMPOUNDS
SODIUM CHLORIDES
SURFACES
THIN FILMS
X-RAY PHOTOELECTRON SPECTROSCOPY