Fabrication and evaluation of GaN negative and bifocal microlenses

Journal Article · Mon Mar 14 23:00:00 EST 2005 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1857062· OSTI ID:20668237

Choi, H W; Gu, E; Liu, C; Girkin, J M; Dawson, M D ^[1]

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1. Institute of Photonics, University of Strathclyde Wolfson Centre, 106 Rottenrow, Glasgow G4 0NW (United Kingdom)

Methods of fabricating negative and bifocal microlens arrays have been demonstrated in this paper. The technique of photoresist molding using a sapphire positive lens template was used for the patterning of negative microlenses, while the bifocal microlens arrays were fabricated using a two-step etch process. In both cases, the lenses were etched using inductively coupled plasma. Microlenses with diameters as small as 10 {mu}m have been demonstrated and were characterized using atomic force microscopy and confocal microscopy. The lens arrays were found to be smooth, uniform, and to have focal lengths consistent with their design and calculated values.

• OSTI ID: 20668237
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 6 Vol. 97; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ATOMIC FORCE MICROSCOPY
EPITAXY
ETCHING
EVALUATION
GALLIUM NITRIDES
LAYERS
LENSES
MICROSTRUCTURE
MOLDING
PHOTORESISTORS
ROUGHNESS
SAPPHIRE
SEMICONDUCTOR MATERIALS