Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting

Journal Article · Mon May 29 04:00:00 EDT 2000 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.126633· OSTI ID:20216500

Hu, Xiaoyuan ^[1]; Cahill, David G ^[1]; Averback, Robert S ^[1]

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1. Department of Materials Science and the Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)

Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 nm thick, are deposited on SiO{sub 2} substrates and subsequently bombarded by 800 keV Kr{sup +}. Ion doses of >2x10{sup 14} initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, ({approx}2x10{sup 16} cm{sup -2}), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr{sup +} impacts. (c) 2000 American Institute of Physics.

• OSTI ID: 20216500
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 22 Vol. 76; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
EXPERIMENTAL DATA
ION BEAMS
MICROSCOPY
PLATINUM
RADIATION EFFECTS
SURFACE PROPERTIES
THIN FILMS
WETTABILITY