Diffraction studies of cubic phase stability in undoped zirconia thin films
- Laboratory for Surface Science and Technology, Department of Physics and Astronomy, University of Maine, Orono, Maine 04469-5764 (United States)
Pure stoichiometric ZrO{sub 2} films were deposited on amorphous silica substrates by electron beam evaporation of Zr in the presence of an electron cyclotron resonance oxygen plasma. Grain size, strain, and texture were analyzed by x-ray diffraction and reflection high-energy electron diffraction. Films grown at room temperature are polycrystalline and exist in the cubic phase. Growth at elevated temperatures produces coexisting cubic and monoclinic phases and shows a maximum critical grain size of {approx}10 nm for stabilization of the cubic phase. Pole figure analysis indicates a preferred cubic [200] fiber axis for room-temperature growth and dual monoclinic (left brace)111{r_brace} and {l_brace}111(bar sign){r_brace} in-plane textures for films grown at 400 degree sign C. Postdeposition annealing experiments confirm the existence of a critical grain size and suggest mechanisms for grain growth. (c) 2000 Materials Research Society.
- OSTI ID:
- 20216017
- Journal Information:
- Journal of Materials Research, Journal Name: Journal of Materials Research Journal Issue: 2 Vol. 15; ISSN JMREEE; ISSN 0884-2914
- Country of Publication:
- United States
- Language:
- English
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