Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation
Journal Article
·
· Journal of Materials Research
- Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, New Mexico 87545 (United States)
- Institute of Electrophysics, Ural Division of the RAS, 620049 Yekaterinburg, Russia (Russian Federation)
Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification use, by a uniform emitted dose rate in the range of 10{sup 16} to 5x10{sup 17} N cm{sup -2} min{sup -1} over an area of <100 cm2 and with acceleration energies of 10-50 keV. The implantation range and retained dose (measured using ion-beam analysis), the surface hardness, coefficient of friction, and the change in the wear coefficient (measured by nanohardness indentation and pin-on-disk wear testing) that were obtained with an applied dose rate of {approx}1.7x10{sup 17} N cm{sup -2} min{sup -1} at 25 kV are given, and they are compared to results obtained with plasma-source ion implantation. (c) 1999 Materials Research Society.
- OSTI ID:
- 20215436
- Journal Information:
- Journal of Materials Research, Journal Name: Journal of Materials Research Journal Issue: 11 Vol. 14; ISSN JMREEE; ISSN 0884-2914
- Country of Publication:
- United States
- Language:
- English
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