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Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation

Journal Article · · Journal of Materials Research
DOI:https://doi.org/10.1557/JMR.1999.0589· OSTI ID:20215436
 [1];  [1];  [1];  [1];  [2]
  1. Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, New Mexico 87545 (United States)
  2. Institute of Electrophysics, Ural Division of the RAS, 620049 Yekaterinburg, Russia (Russian Federation)
Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification use, by a uniform emitted dose rate in the range of 10{sup 16} to 5x10{sup 17} N cm{sup -2} min{sup -1} over an area of <100 cm2 and with acceleration energies of 10-50 keV. The implantation range and retained dose (measured using ion-beam analysis), the surface hardness, coefficient of friction, and the change in the wear coefficient (measured by nanohardness indentation and pin-on-disk wear testing) that were obtained with an applied dose rate of {approx}1.7x10{sup 17} N cm{sup -2} min{sup -1} at 25 kV are given, and they are compared to results obtained with plasma-source ion implantation. (c) 1999 Materials Research Society.
OSTI ID:
20215436
Journal Information:
Journal of Materials Research, Journal Name: Journal of Materials Research Journal Issue: 11 Vol. 14; ISSN JMREEE; ISSN 0884-2914
Country of Publication:
United States
Language:
English